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X-Ray CT Inspection of Silicon Carbide Cracks and Inclusions
Pubdate 2026-01-06

Microscopic Insight: 3D X-Ray CT Non-Destructive Inspection of
Internal Cracks and Inclusions in Silicon Carbide (SiC)

As a core material of third-generation semiconductors, silicon carbide (SiC) is highly prone to generating internal micro-cracks, voids, and inclusions that are invisible to the naked eye during crystal growth and machining. If not eliminated, these defects can cause device failure under high-voltage and high-temperature operating conditions. Industrial-grade X-Ray CT inspection systems leverage tomographic scanning technology to become a key solution to this challenge.

01 Precise Spatial Localization            Acquire XYZ three-dimensional coordinates of cracks, free from planar overlap interference.
02 Defect Volume Quantification            Automatically calculate void ratio (Void %) and inclusion volume, providing quantitative data.

Comparative CT Inspection Images of SiC Samples

3D X-Ray CT inspection revealing the three-dimensional morphology of cracks in silicon carbide (SiC) wafers
Figure 1: 3D Volumetric Rendering View
Industrial X-Ray CT tomographic analysis of internal inclusion distribution and microstructure in silicon carbide (SiC)
Figure 2: CT Tomographic Analysis View

In accordance with commercial confidentiality agreements and respect for intellectual property rights, the X-Ray inspection images shown here are for technical capability demonstration purposes only.

       Wahfei sincerely invites you to bring or ship samples to experience the actual inspection performance of the system.

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